Inverters with Different Load Configurations and a Two-Input Multiplexer Based on IGZO NMOS TFTs

Amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) have emerged as promising candidates for next-generation large-area and low-power electronics due to their high mobility, low leakage current, and compatibility with low-temperature fabrication on flexible or transparent substrates. In this work, we report the fabrication of bottom-gate a-IGZO NMOS TFTs using HfO<sub>2</sub> as high-k gate dielectric and Mo top contacts. The devices were electrically characterized through capacitance-voltage (C-V) and current-voltage (I-V) measurements, from which key parameters were extracted. Based on these transistors, we designed, fabricated, and characterized inverters employing four different load configurations: resistive, diode, depletion, and pseudo-CMOS. A comparative analysis was performed in terms of voltage transfer characteristics (VTCs), gain, and noise margins, highlighting that depletion-load inverters offer the highest gain and robust noise margins. Finally, a two-channel multiplexer was designed and fabricated. The multiplexer was characterized under both square and sinusoidal input signals up to 1 kHz, demonstrating correct channel selection and robust switching behavior. These results confirm the potential of a-IGZO TFT-based circuits as building blocks for low-power and high-reliability digital and mixed-signal electronics.

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Publication Details

Journal
Nanomaterials
Published
2026-01-06
DOI
https://doi.org/10.3390/nano16020078
Primary Topic
Thin-Film Transistor Technologies
Type
article
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article

Inverters with Different Load Configurations and a Two-Input Multiplexer Based on IGZO NMOS TFTs

A. Torres, Rodolfo Z. García, Jimena Quintero, Isai S Hernández-Luna et al.
Nanomaterials
Thin-Film Transistor Technologies
article

Inverters with Different Load Configurations and a Two-Input Multiplexer Based on IGZO NMOS TFTs

A. Torres, Rodolfo Z. García, Jimena Quintero, Isai S Hernández-Luna, Hernández Como Norberto, Miguel Aleman
article en

Abstract

Amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) have emerged as promising candidates for next-generation large-area and low-power electronics due to their high mobility, low leakage current, and compatibility with low-temperature fabrication on flexible or transparent substrates. In this work, we report the fabrication of bottom-gate a-IGZO NMOS TFTs using HfO<sub>2</sub> as high-k gate dielectric and Mo top contacts. The devices were electrically characterized through capacitance-voltage (C-V) and current-voltage (I-V) measurements, from which key parameters were extracted. Based on these transistors, we designed, fabricated, and characterized inverters employing four different load configurations: resistive, diode, depletion, and pseudo-CMOS. A comparative analysis was performed in terms of voltage transfer characteristics (VTCs), gain, and noise margins, highlighting that depletion-load inverters offer the highest gain and robust noise margins. Finally, a two-channel multiplexer was designed and fabricated. The multiplexer was characterized under both square and sinusoidal input signals up to 1 kHz, demonstrating correct channel selection and robust switching behavior. These results confirm the potential of a-IGZO TFT-based circuits as building blocks for low-power and high-reliability digital and mixed-signal electronics.

NanomaterialsVol. 16(2)
Universidad Autónoma del Estado de México (MX), Universidad del Tacana (MX), Universidad de Ecatepec (MX), Instituto Politécnico Nacional (MX)
Affordable and clean energy
Openalex Percentile: Top 96%
Thin-Film Transistor Technologies
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