Pushing Ultrafast Laser Technology to Atomic-Level Manufacturing
Atomic-level manufacturing is a next-generation fabrication technology that offers unprecedented precision and high performance for applications in diverse fields, such as new energy materials and quantum computing. Owing to ultrashort pulse duration and extremely high peak power, ultrafast lasers enable the fabrication of complex micro/nanostructures and features beyond the diffraction limit, presenting promising opportunities for atomic-level manufacturing. Herein, we summarize recent progress in this emerging field, with a focus on zero-dimensional and two-dimensional nanomaterials as representative cases. We also assess the feasibility of ultrafast laser technology for atomic-level manufacturing. Finally, we discuss the challenges and prospects for its future development. This work aims to provide insights into the precise and controllable fabrication capabilities of this technology.
Authors
- Kai Yin (ORCID: https://orcid.org/0000-0002-0763-3834)
- First J. Xiao
- Fan Zhang (ORCID: https://orcid.org/0000-0003-1248-0278)
- Lingxiao Wang (ORCID: https://orcid.org/0000-0003-3757-3403)
- Ji-an Duan
- Yu Chen
Institutions
- Central South University (CN)
- NeoPhotonics (United States) (US)
- Nanophoton (Brazil) (BR)
Publication Details
- Journal
- Langmuir
- Published
- 2026-01-05
- DOI
- https://doi.org/10.1021/acs.langmuir.5c04902
- Primary Topic
- Laser Material Processing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00