Nonlocal Metasurfaces with Lithographically Defined Vertical Symmetry Breaking

Nonlocal metasurfaces have garnered significant interest for applications that require customized and enhanced light–matter interactions in a flat form factor. These metasurfaces are distinctive for their ability to systematically control some of the fundamental properties of optical resonances by manipulating the in-plane symmetry of the lattice. Recent theoretical works have suggested that engineering the symmetry of a metasurface not just within the plane of the metasurface but also in the vertical or out-of-plane direction enables improved control of additional fundamental properties, especially chirality. However, standard nanofabrication processes cannot readily support elaborate vertical symmetry breaking such as nanostructure heights or slopes that deliberately vary across the footprint of a metasurface. In this work, we experimentally demonstrate a scalable method to lithographically define the vertical symmetry of nonlocal metasurfaces by selectively eroding the etch mask during the etch process. Moreover, as the etch mask erosion rates depend on the in-plane size of individual nanostructures, we introduce and experimentally demonstrate a compatible design framework that enables versatile control over the properties of optical resonances. The results hold promise for chiral nonlocal metasurfaces with highly customized behavior.