Structure and Magnetic Properties of Iron Thin Films Prepared at Different Deposition Times

In this paper, a series of iron thin films were prepared using the direct current magnetron sputtering method at different deposition times. By means of characterization techniques such as X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM), and vibrating sample magnetometer (VSM), the structure, surface morphology, and magnetic properties of the iron thin films prepared at different deposition times were systematically investigated. The XRD results indicate that all the iron thin films exhibit a polycrystalline body-centered cubic structure, with an obvious preferred orientation in the (110) direction. As the deposition time increases, the average grain size of the iron thin films gradually increases. This is mainly because the post-sputtered atoms can provide the energy required for the formation, movement, and growth of the already deposited grains or clusters. When the deposition time is too long, factors such as elastic effects and size constraints will limit the growth of grains and clusters. Therefore, for the thin films deposited after 120 s, the average grain size gradually stabilizes. When the deposition time is short, the thin films usually grow in the form of island-like accumulation. Grains and clusters of uneven sizes accumulate on the substrate, so the roughness gradually increases. This also implies an increase in the density of defects such as internal stress and vacancies within the thin film. As the deposition time increases, the thin films gradually transform to grow in a layered and flat manner, and the grain size gradually stabilizes and becomes relatively uniform. Therefore, the roughness of the thin film samples decreases and tends to be stable. The magnetic property test results show that all the iron thin films exhibit ferromagnetism. The iron thin film prepared at a deposition time of 120 s has the best comprehensive performance, with a saturation magnetization M<sub>s</sub> of 1567 emu/cm<sup>3</sup>, a coercivity of 92 Oe, and a remanence ratio of 0.86.

Authors

Institutions

Publication Details

Journal
Materials
Published
2026-01-02
DOI
https://doi.org/10.3390/ma19010165
Primary Topic
Magnetic properties of thin films
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Structure and Magnetic Properties of Iron Thin Films Prepared at Different Deposition Times

Liang Yan, Chunxia Zhou, Biao YAN, Zhiya Han
Materials
Magnetic properties of thin films
article

Structure and Magnetic Properties of Iron Thin Films Prepared at Different Deposition Times

Liang Yan, Chunxia Zhou, Biao YAN, Zhiya Han
article en

Abstract

In this paper, a series of iron thin films were prepared using the direct current magnetron sputtering method at different deposition times. By means of characterization techniques such as X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM), and vibrating sample magnetometer (VSM), the structure, surface morphology, and magnetic properties of the iron thin films prepared at different deposition times were systematically investigated. The XRD results indicate that all the iron thin films exhibit a polycrystalline body-centered cubic structure, with an obvious preferred orientation in the (110) direction. As the deposition time increases, the average grain size of the iron thin films gradually increases. This is mainly because the post-sputtered atoms can provide the energy required for the formation, movement, and growth of the already deposited grains or clusters. When the deposition time is too long, factors such as elastic effects and size constraints will limit the growth of grains and clusters. Therefore, for the thin films deposited after 120 s, the average grain size gradually stabilizes. When the deposition time is short, the thin films usually grow in the form of island-like accumulation. Grains and clusters of uneven sizes accumulate on the substrate, so the roughness gradually increases. This also implies an increase in the density of defects such as internal stress and vacancies within the thin film. As the deposition time increases, the thin films gradually transform to grow in a layered and flat manner, and the grain size gradually stabilizes and becomes relatively uniform. Therefore, the roughness of the thin film samples decreases and tends to be stable. The magnetic property test results show that all the iron thin films exhibit ferromagnetism. The iron thin film prepared at a deposition time of 120 s has the best comprehensive performance, with a saturation magnetization M<sub>s</sub> of 1567 emu/cm<sup>3</sup>, a coercivity of 92 Oe, and a remanence ratio of 0.86.

MaterialsVol. 19(1)
Tongji University (CN), Shanghai Polytechnic University (CN), Shanghai Dianji University (CN)
Affordable and clean energy
Openalex Percentile: Top 96%
Magnetic properties of thin films
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.