New Development of Chemically Amplified Resist

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Publication Details

Journal
Kobunshi
Published
2025-12-31
DOI
https://doi.org/10.1295/kobunshi.75.1_12
Primary Topic
Advancements in Photolithography Techniques
Type
article
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article

New Development of Chemically Amplified Resist

Hideo HORIBE, Katsuaki Takashima
Kobunshi
Advancements in Photolithography Techniques
article

New Development of Chemically Amplified Resist

Hideo HORIBE, Katsuaki Takashima
article en

Abstract

No abstract available for this paper.
KobunshiVol. 75(1)
Osaka Metropolitan University (JP)
Openalex Percentile: Top 40%
Advancements in Photolithography Techniques
DOISourceOpenAlex
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New Development of Chemically Amplified Resist — Hideo HORIBE, Katsuaki Takashima · Kobunshi (2025) | TGRS Research Map | TGRS