SiMiC: Context-aware silicon microstructure characterization using attention-based convolutional neural networks for field-emission tip analysis

Accurate characterization of silicon microstructures is essential for advancing microscale fabrication, quality control, and device performance. Traditional analysis using scanning electron microscopy (SEM) often requires labor-intensive, manual evaluation of feature geometry, limiting throughput and reproducibility. In this study, we propose SiMiC: Context-aware Silicon Microstructure Characterization Using Attention-based Convolutional Neural Networks for Field-Emission Tip Analysis. By leveraging deep learning, our approach efficiently extracts morphological features—such as size, shape, and apex curvature—from SEM images, significantly reducing human intervention while improving measurement consistency. A specialized dataset of silicon-based field-emitter tips was developed, and a customized convolutional neural network architecture incorporating attention mechanisms was trained for multiclass microstructure classification and dimensional prediction. Comparative analysis with classical image processing techniques demonstrates that SiMiC achieves high accuracy while maintaining interpretability. The proposed framework establishes a foundation for data-driven microstructure analysis directly linked to field-emission performance, opening avenues for correlating emitter geometry with emission behavior and guiding the design of optimized cold-cathode and SEM electron sources. The related dataset and algorithm repository that could serve as a baseline in this area can be found at https://research.jingjietan.com/?q=SIMIC.

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Publication Details

Journal
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
Published
2025-12-01
DOI
https://doi.org/10.1116/6.0005068
Primary Topic
Advanced Electron Microscopy Techniques and Applications
Type
article
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article

SiMiC: Context-aware silicon microstructure characterization using attention-based convolutional neural networks for field-emission tip analysis

Simon Edler, Matthias Hausladen, Andreas Schels, Rupert Schreiner et al.
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
Advanced Electron Microscopy Techniques and Applications
article

SiMiC: Context-aware silicon microstructure characterization using attention-based convolutional neural networks for field-emission tip analysis

Simon Edler, Matthias Hausladen, Andreas Schels, Rupert Schreiner, Julian Bartsch, Ali Asgharzade, Ban-Hoe Kwan, Michael Bachmann, Yan-Chai Hum, Jing Jie Tan, Danny Wee-Kiat Ng
article en

Abstract

Accurate characterization of silicon microstructures is essential for advancing microscale fabrication, quality control, and device performance. Traditional analysis using scanning electron microscopy (SEM) often requires labor-intensive, manual evaluation of feature geometry, limiting throughput and reproducibility. In this study, we propose SiMiC: Context-aware Silicon Microstructure Characterization Using Attention-based Convolutional Neural Networks for Field-Emission Tip Analysis. By leveraging deep learning, our approach efficiently extracts morphological features—such as size, shape, and apex curvature—from SEM images, significantly reducing human intervention while improving measurement consistency. A specialized dataset of silicon-based field-emitter tips was developed, and a customized convolutional neural network architecture incorporating attention mechanisms was trained for multiclass microstructure classification and dimensional prediction. Comparative analysis with classical image processing techniques demonstrates that SiMiC achieves high accuracy while maintaining interpretability. The proposed framework establishes a foundation for data-driven microstructure analysis directly linked to field-emission performance, opening avenues for correlating emitter geometry with emission behavior and guiding the design of optimized cold-cathode and SEM electron sources. The related dataset and algorithm repository that could serve as a baseline in this area can be found at https://research.jingjietan.com/?q=SIMIC.

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaVol. 43(6)
OTH Regensburg (DE), München Klinik (DE), Universiti Tunku Abdul Rahman (MY)
Decent work and economic growth
Openalex Percentile: Top 17%
Advanced Electron Microscopy Techniques and Applications
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