Regulation Mechanism of Functional Group Type and Concentration Gradient Doping on Interfacial Electronic Properties and Charge Transfer in Zr <sub>2</sub> CT <sub> <i>x</i> </sub> –MoS <sub>2</sub> Heterojunctions

This study constructed the Zr<sub>2</sub>CT<sub><i>x</i></sub>-MoS<sub>2</sub> vdW-HS and focused on discussing the modulation mechanisms and trends of the SBH in this system under the influence of different functional group types (-F/-O/-OH) and concentration gradients (0%, 25%, 50%, 75%, 100%). Phonon spectrum and interfacial binding energy calculations revealed that all structures possess stability. Systems with >50% -O concentration exhibited bandgaps, enabling heterojunction bandgap modulation between 0.02 and 1.35 eV. Opposite trends emerged between n-type (Φ<sub>e</sub>) and p-type (Φ<sub>h</sub>) SBH: in -O systems, increasing -O concentration progressively decreased Φ<sub>h</sub> while increasing Φ<sub>e</sub>, yielding maximum/minimum Φ<sub>e</sub> values of 0.668/-0.362 eV and Φ<sub>h</sub> values of 1.366/0.418 eV. Systems with -OH doped into -F configurations exhibited stable SBH variations, with n-type Ohmic contacts emerging repeatedly during functional group doping and tuning processes. These phenomena originate from doping-induced work function changes (2.0-4.3 eV range), where altered work function differences drive interfacial charge redistribution. This subsequently modulates the direction and magnitude of MoS<sub>2</sub> band bending, ultimately shifting its CBM and VBM to achieve SBH control. These findings provide a theoretical basis for designing and optimizing high-performance two-dimensional semiconductor devices that are more miniaturized and have lower contact resistance.

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Journal
Langmuir
Published
2025-12-24
DOI
https://doi.org/10.1021/acs.langmuir.5c04880
Primary Topic
2D Materials and Applications
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article
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article

Regulation Mechanism of Functional Group Type and Concentration Gradient Doping on Interfacial Electronic Properties and Charge Transfer in Zr 2 CT x –MoS 2 Heterojunctions

Hui Lu, Mengjia Xu, Zhixin Hou, Yi Zheng et al.
Langmuir
2D Materials and Applications
article

Regulation Mechanism of Functional Group Type and Concentration Gradient Doping on Interfacial Electronic Properties and Charge Transfer in Zr 2 CT x –MoS 2 Heterojunctions

Hui Lu, Mengjia Xu, Zhixin Hou, Yi Zheng, Jieshi Chen, Kai Xiong
article en

Abstract

This study constructed the Zr<sub>2</sub>CT<sub><i>x</i></sub>-MoS<sub>2</sub> vdW-HS and focused on discussing the modulation mechanisms and trends of the SBH in this system under the influence of different functional group types (-F/-O/-OH) and concentration gradients (0%, 25%, 50%, 75%, 100%). Phonon spectrum and interfacial binding energy calculations revealed that all structures possess stability. Systems with >50% -O concentration exhibited bandgaps, enabling heterojunction bandgap modulation between 0.02 and 1.35 eV. Opposite trends emerged between n-type (Φ<sub>e</sub>) and p-type (Φ<sub>h</sub>) SBH: in -O systems, increasing -O concentration progressively decreased Φ<sub>h</sub> while increasing Φ<sub>e</sub>, yielding maximum/minimum Φ<sub>e</sub> values of 0.668/-0.362 eV and Φ<sub>h</sub> values of 1.366/0.418 eV. Systems with -OH doped into -F configurations exhibited stable SBH variations, with n-type Ohmic contacts emerging repeatedly during functional group doping and tuning processes. These phenomena originate from doping-induced work function changes (2.0-4.3 eV range), where altered work function differences drive interfacial charge redistribution. This subsequently modulates the direction and magnitude of MoS<sub>2</sub> band bending, ultimately shifting its CBM and VBM to achieve SBH control. These findings provide a theoretical basis for designing and optimizing high-performance two-dimensional semiconductor devices that are more miniaturized and have lower contact resistance.

LangmuirVol. 42(1)
Shanghai University of Engineering Science (CN), Foshan University (CN), Shanghai Jiao Tong University (CN), Yunnan University (CN), Advanced Energy Materials (United States) (US), Universidad del Noreste (MX)
Affordable and clean energy
Openalex Percentile: Top 48%
2D Materials and Applications
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