Highly Stretchable and Free-Standing AgNWs/PDMS Three-Dimensional Structure Transparent Conductive Films for Nanoimprint Lithography

This article proposes a novel transparent conductive film structure to solve the problem of electrostatic accumulation in traditional nanoimprint lithography processes. This structure is formed by spin-coating a layer of silver nanowire (AgNWs) transparent conductive films on a graphic substrate, followed by coating a layer of polydimethylsiloxane (PDMS) on the surface of the film. After the PDMS is cured, it is peeled off from the substrate to form a free-standing elastic three-dimensional structured surface. These transparent conductive films are not only designed to mitigate static electricity generated during the nanoimprint lithography process, but also have excellent UV transparency, with a 325 nm UV transmittance of up to 90%. At the same time, it exhibits good conductivity with a sheet resistance of 20 Ω/sq. In addition, the films have excellent elasticity and can maintain stable conductivity during repeated stretching, providing a novel solution for flexible optoelectronic devices and nanoimprint technology.