Single-frame randomized probe imaging in the EUV using a high-order harmonic source

We report the demonstration of single-frame randomized probe imaging (RPI) using a 13.5 nm extreme ultraviolet (EUV) beam from a table-top high-harmonic generation (HHG) source. Three types of beams-a smooth, vortex, and speckle beam-were used to investigate the effect of different illuminations on image quality. Single-frame RPI reconstructions were successfully achieved for all beam types, with the highest resolution of 110 nm obtained using the EUV speckle beam. Comparisons with ptychography reconstructions confirm the advantages of structured illuminations over a smooth beam, showing improved convergence and image fidelity. Furthermore, averaging a small number of RPI images reconstructed from individual diffraction patterns significantly improves the resolution to sub-100 nm. These results demonstrate the capability of single-frame RPI to deliver rapid, high-resolution EUV imaging, offering a promising approach for applications limited by acquisition time, such as ultrafast pump-probe studies and real-time feedback.

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Publication Details

Journal
Optics Express
Published
2025-12-23
DOI
https://doi.org/10.1364/oe.580785
Primary Topic
Photorefractive and Nonlinear Optics
Type
article
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article

Single-frame randomized probe imaging in the EUV using a high-order harmonic source

Jan Rothhardt, Wilhelm Eschen, Soo Hoon Chew, Chang Liu et al.
Optics Express
Photorefractive and Nonlinear Optics
article

Single-frame randomized probe imaging in the EUV using a high-order harmonic source

Jan Rothhardt, Wilhelm Eschen, Soo Hoon Chew, Chang Liu, Jens Limpert, Mahmoud Abdelaal
article en

Abstract

We report the demonstration of single-frame randomized probe imaging (RPI) using a 13.5 nm extreme ultraviolet (EUV) beam from a table-top high-harmonic generation (HHG) source. Three types of beams-a smooth, vortex, and speckle beam-were used to investigate the effect of different illuminations on image quality. Single-frame RPI reconstructions were successfully achieved for all beam types, with the highest resolution of 110 nm obtained using the EUV speckle beam. Comparisons with ptychography reconstructions confirm the advantages of structured illuminations over a smooth beam, showing improved convergence and image fidelity. Furthermore, averaging a small number of RPI images reconstructed from individual diffraction patterns significantly improves the resolution to sub-100 nm. These results demonstrate the capability of single-frame RPI to deliver rapid, high-resolution EUV imaging, offering a promising approach for applications limited by acquisition time, such as ultrafast pump-probe studies and real-time feedback.

Optics ExpressVol. 34(5)
Helmholtz Institute Jena (DE), GSI Helmholtz Centre for Heavy Ion Research (DE), Fraunhofer Institute for Applied Optics and Precision Engineering (DE), Friedrich Schiller University Jena (DE)
Affordable and clean energy
Openalex Percentile: Top 32%
Photorefractive and Nonlinear Optics
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Single-frame randomized probe imaging in the EUV using a high-order harmonic source — Jan Rothhardt, Wilhelm Eschen, et al. · Optics Express (2025) | TGRS Research Map | TGRS