Transverse photoresistivity from photothermal current deflection in metal films

Quantum geometry in centrosymmetric systems has motivated the search for photocurrent responses beyond second order. In particular, electric field-induced nonlinear responses may also enable intrinsic polarization-sensitive optical detectors. Despite numerous efforts, clear methods are still needed to remove experimental artifacts, separating intrinsic from extrinsic effects, and disentangling linear responses from their higher-order counterparts. Here, we provide a systematic study of fabrication and measurement techniques to remove external artifacts in photoelectronic responses. This reveals a previously hidden photothermoelectric response in the transverse photoresistivity of symmetric thin films of simple metals. We identify its origin in thermal gradients producing current deflection and determine the device design and measurement parameters to minimize extrinsic effects that arise in photoinduced electronic responses.

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Publication Details

Journal
Journal of Applied Physics
Published
2025-12-23
DOI
https://doi.org/10.1063/5.0278567
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
0.00

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article

Transverse photoresistivity from photothermal current deflection in metal films

Michael Geiwitz, G. Natale, Piyush Sakrikar, Vincent Plisson et al.
Journal of Applied Physics
Topological Materials and Phenomena
article

Transverse photoresistivity from photothermal current deflection in metal films

Michael Geiwitz, G. Natale, Piyush Sakrikar, Vincent Plisson, Kenneth S. Burch, Krzysztof Kempa, Ying Ran, Cameron Grant, Dylan Rosenmerkel
article en

Abstract

Quantum geometry in centrosymmetric systems has motivated the search for photocurrent responses beyond second order. In particular, electric field-induced nonlinear responses may also enable intrinsic polarization-sensitive optical detectors. Despite numerous efforts, clear methods are still needed to remove experimental artifacts, separating intrinsic from extrinsic effects, and disentangling linear responses from their higher-order counterparts. Here, we provide a systematic study of fabrication and measurement techniques to remove external artifacts in photoelectronic responses. This reveals a previously hidden photothermoelectric response in the transverse photoresistivity of symmetric thin films of simple metals. We identify its origin in thermal gradients producing current deflection and determine the device design and measurement parameters to minimize extrinsic effects that arise in photoinduced electronic responses.

Journal of Applied PhysicsVol. 138(24)
Boston College (US)
U.S. Department of Energy, Boston College, Office of Science, Basic Energy Sciences
Openalex Percentile: Top 33%
Topological Materials and Phenomena
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