Unveiling the structural and electrochemical effects of Al <sub>2</sub> O <sub>3</sub> incorporation within LiPON electrolyte thin films by atomic layer deposition

Thin film solid-state electrolytes (SSEs) have emerged as a key component in the development of microenergy storage devices, offering improved safety, stability and compatibility with advanced electrode materials. Among these electrolytes, lithium phosphorus oxynitride (LiPON) stands out as a relevant SSE candidate for microsupercapacitor applications. As with most ionic conductors, a margin for improvement always exists to enhance their overall performance. Within this scope, efforts to optimize LiPON through doping have been extensively explored, primarily using Physical Vapour Deposition (PVD) to provide films with relatively high thicknesses (500 nm-1 µm) and superior ionic conductivity. In this study, the use of Atomic Layer Deposition (ALD) for doping LiPON thin films (<50 nm) was explored for the first time, by inserting aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) as a network former. Through the ALD supercycle approach, Al<sub>2</sub>O<sub>3</sub> doped-LiPON thin films were deposited at 330 °C, using lithium hexamethyldisilazide (LiHMDS) and diethyl phosphoramidate (DEPA), while Al<sub>2</sub>O<sub>3</sub> traces were injected during the film growth <i>via</i> trimethylaluminum (TMA) and water (H<sub>2</sub>O) pulses. The resulting amorphous films were depth profiled by Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and demonstrated a uniform distribution of aluminium throughout the film's thickness for different doping levels. The incorporation of Al<sub>2</sub>O<sub>3</sub> is intended to enable additional Li<sup>+</sup> transport pathways through modified bridging configurations, particularly in oxygen and nitrogen environments. The Fourier transform infrared spectroscopy (FTIR) analysis indicated a prevalence of Bridging Oxygen (BO) and divalent nitrogen (N<sub>d</sub>) units upon doping. These findings were further supported by X-ray photoelectron spectroscopy (XPS), underlining an increase in the ratios of Bridging Oxygen to Non-Bridging Oxygen (BO/NBO) and divalent nitrogen to trivalent nitrogen (N<sub>d</sub>/N<sub>t</sub>) along with higher lithium and lower carbon concentrations. The obtained structural modifications were accompanied by a stimulated Li<sup>+</sup> ionic transport and a reduced activation energy, while maintaining a good insulating property and an electrochemical stability over a wide voltage window (up to 6 V).

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Journal
Dalton Transactions
Published
2025-12-23
DOI
https://doi.org/10.1039/d5dt02597d
Citations
1
Primary Topic
Advancements in Battery Materials
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article
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article

Unveiling the structural and electrochemical effects of Al 2 O 3 incorporation within LiPON electrolyte thin films by atomic layer deposition

Hélène Coudert-Alteirac, Nicolas Vaxelaire, Violaine Salvador, Lara Casiez et al.
1 citations
Dalton Transactions
Advancements in Battery Materials
0.73
article

Unveiling the structural and electrochemical effects of Al 2 O 3 incorporation within LiPON electrolyte thin films by atomic layer deposition

Hélène Coudert-Alteirac, Nicolas Vaxelaire, Violaine Salvador, Lara Casiez, Messaoud Bedjaoui, Sylvain Poulet, Manon Létiche, Mikhael Bechelany, Ilyass Ghandari, Nicolas Gauthier, Névine Rochat
article en
1 citations

Abstract

Thin film solid-state electrolytes (SSEs) have emerged as a key component in the development of microenergy storage devices, offering improved safety, stability and compatibility with advanced electrode materials. Among these electrolytes, lithium phosphorus oxynitride (LiPON) stands out as a relevant SSE candidate for microsupercapacitor applications. As with most ionic conductors, a margin for improvement always exists to enhance their overall performance. Within this scope, efforts to optimize LiPON through doping have been extensively explored, primarily using Physical Vapour Deposition (PVD) to provide films with relatively high thicknesses (500 nm-1 µm) and superior ionic conductivity. In this study, the use of Atomic Layer Deposition (ALD) for doping LiPON thin films (<50 nm) was explored for the first time, by inserting aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) as a network former. Through the ALD supercycle approach, Al<sub>2</sub>O<sub>3</sub> doped-LiPON thin films were deposited at 330 °C, using lithium hexamethyldisilazide (LiHMDS) and diethyl phosphoramidate (DEPA), while Al<sub>2</sub>O<sub>3</sub> traces were injected during the film growth <i>via</i> trimethylaluminum (TMA) and water (H<sub>2</sub>O) pulses. The resulting amorphous films were depth profiled by Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and demonstrated a uniform distribution of aluminium throughout the film's thickness for different doping levels. The incorporation of Al<sub>2</sub>O<sub>3</sub> is intended to enable additional Li<sup>+</sup> transport pathways through modified bridging configurations, particularly in oxygen and nitrogen environments. The Fourier transform infrared spectroscopy (FTIR) analysis indicated a prevalence of Bridging Oxygen (BO) and divalent nitrogen (N<sub>d</sub>) units upon doping. These findings were further supported by X-ray photoelectron spectroscopy (XPS), underlining an increase in the ratios of Bridging Oxygen to Non-Bridging Oxygen (BO/NBO) and divalent nitrogen to trivalent nitrogen (N<sub>d</sub>/N<sub>t</sub>) along with higher lithium and lower carbon concentrations. The obtained structural modifications were accompanied by a stimulated Li<sup>+</sup> ionic transport and a reduced activation energy, while maintaining a good insulating property and an electrochemical stability over a wide voltage window (up to 6 V).

Dalton TransactionsVol. 55(3)
Centre National de la Recherche Scientifique (FR), Université de Montpellier (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), CEA Grenoble (FR), Direction de la Recherche Technologique (FR), Laboratoire d'Électronique des Technologies de l'Information (FR), Institut Européen des Membranes (FR), Université Grenoble Alpes (FR)
Affordable and clean energy
Openalex Percentile: Top 20%
Advancements in Battery Materials
0.73
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