Wafer-Scale Integration of Lithium Niobate on a Silicon Photonics 200-mm Platform
We demonstrate a scalable approach for integrating lithium niobate onto silicon photonics using wafer-scale micro-transfer printing, enabling high-speed modulators with a 3.8 V half-wave voltage and over 70 GHz bandwidth. As proof of concept, over 200 lithium niobate structures were integrated on a <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{2 0 0}-\text{mm}$</tex> wafer.
Authors
- Peter Geerinck
- Tom Vanackere (ORCID: https://orcid.org/0000-0003-4692-9467)
- Filippo Ferraro (ORCID: https://orcid.org/0000-0002-9328-5548)
- Nishant Singh (ORCID: https://orcid.org/0000-0003-0609-1145)
- Sadhishkumar Balakrishnan (ORCID: https://orcid.org/0000-0002-6376-3019)
- Martin Davi
- Sebastian Hänsch
- Emadreza Soltanian (ORCID: https://orcid.org/0000-0002-6091-7350)
- Sarah Uvin (ORCID: https://orcid.org/0000-0001-6008-9906)
- Dieter Bode
- P. Absil (ORCID: https://orcid.org/0009-0001-5644-1628)
- Arno Moerman (ORCID: https://orcid.org/0000-0003-0945-2786)
- Ewoud Vissers (ORCID: https://orcid.org/0000-0002-5765-0552)
- Joris Van Campenhout (ORCID: https://orcid.org/0000-0003-0778-2669)
- Margot Niels
- Neha Singh (ORCID: https://orcid.org/0000-0002-4972-0012)
- Jing Zhang (ORCID: https://orcid.org/0000-0003-0741-7848)
- Xiujun Zheng
- Hanh Mai
- Xin Guo (ORCID: https://orcid.org/0000-0002-4744-1968)
- Sofie Janssen
- Peter Verheyen
- Gunther Roelkens
- Bart Kuyken
- Maximilien Billet
Institutions
- Ghent University Hospital (BE)
- Ghent University (BE)
- iMinds (BE)
- IMEC (BE)
- Hebei Semiconductor Research Institute (CN)
Publication Details
- Published
- 2025-11-09
- DOI
- https://doi.org/10.1109/ipc65510.2025.11282050
- Primary Topic
- Photorefractive and Nonlinear Optics
- Type
- article
- Field-Weighted Citation Impact
- 0.00