Etch Engineered InP Processing for a Fabrication Tolerant Slanted Waveguide
We present a process for fabrication-tolerant slanted waveguides used in photonic integrated devices requiring asymmetry. An etch-stop waveguide is positioned parallel to the main waveguide, enabling the self-limiting feature of bromine–methanol etching. A V-groove forms, allowing controlled etch termination. Demonstration is on InP waveguides.
Authors
- Jeroen Bolk (ORCID: https://orcid.org/0000-0003-2526-681X)
- W. Yao
- K. Mehrabi
- J. J. G. M. van der Tol
- F. J. Pronk
Institutions
- Eindhoven University of Technology (NL)
Publication Details
- Published
- 2025-11-09
- DOI
- https://doi.org/10.1109/ipc65510.2025.11281991
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00