Fabrication parameters for modification regimes in fused silica using 1030 nm femtosecond laser beams

We mapped fabrication windows for writing in bulk fused silica at 1030 nm by varying the pulse energy, pulse duration, repetition rate, and scan speed. Pairwise heat maps and absorption-corrected data show that Type I change remains accessible from 0.3 ps to 1.0 ps and that pulse density is the dominant control once thresholds are exceeded. Using a lawn mower model, we extracted threshold scaling with pulse duration consistent with prior work. These results provide practical parameter sets and scaling laws for precise and reproducible femtosecond laser modification of fused silica.