Photothermal chemical mechanical polishing: a synergistic mechanism for fast and atomic level surface perfection
A photothermal chemical mechanical polishing (PTCMP) technique is developed with defect-engineered black nano-titanium dioxide (TiO 2 ) as the photothermal catalyst, achieving high material removal rate and atomic-level surface roughness.
Institutions
- Soochow University (CN)
- Institute of Semiconductors (CN)
- Institute of New Materials (CN)
- Zhejiang University (CN)
Publication Details
- Journal
- Journal of Materials Chemistry A
- Published
- 2025-12-12
- DOI
- https://doi.org/10.1039/d5ta07359f
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00