Hoog gevoelige en nauwkeurige kwantificatie van boor via ionenbundelanalyse

In this research, an advanced Rutherford Backscattering (RBS) with sub-nanometer resolution technique will be developed to characterize the microscopic properties of carbon nanotube pellicles, a kind of membranes with the thickness of only several tens of nanometers to protect photomasks from contamination in the process of EUV lithography, to gain a deep understanding of the damage due to the EUV exposure. Besides, the total-IBA technique which combines the data from various detection schemes will also be developed to construct a comprehensive and self-consistent characterization of pellicles by yielding a more sensitive detection of the changes due to the EUV exposure. Furthermore, the effects of the ion beam on the properties of membranes during IBA analysis and the stopping power and screening effects will also be explored.