Nanofabrication of monolithically integrated multilayer metasurfaces via fully CMOS-compatible processes

We have developed a novel metasurface stacking methodology that is fully compatible with standard Complementary Metal-Oxide-Semiconductor（CMOS） processes, advancing the mass production and commercialization of metasurface technologies.

Publication Details

Journal
ePrints Soton (University of Southampton)
Published
2025-09-15
Primary Topic
Anodic Oxide Films and Nanostructures
Type
article
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article

Nanofabrication of monolithically integrated multilayer metasurfaces via fully CMOS-compatible processes

ePrints Soton (University of Southampton)
Anodic Oxide Films and Nanostructures
article

Nanofabrication of monolithically integrated multilayer metasurfaces via fully CMOS-compatible processes

article en

Abstract

We have developed a novel metasurface stacking methodology that is fully compatible with standard Complementary Metal-Oxide-Semiconductor（CMOS） processes, advancing the mass production and commercialization of metasurface technologies.

ePrints Soton (University of Southampton)
Industry, innovation and infrastructure
Openalex Percentile: Top 51%
Anodic Oxide Films and Nanostructures
OpenAlex
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