Doping-dependent fixed charges in SiC/SiO₂ structure

Doping-dependent fixed charges were found in SiC/SiO₂ structures through a study on threshold voltage in both n- and p-channel SiC metal-oxide-semiconductor field-effect transistors (MOSFETs) with various body doping concentrations. Positive fixed charges increase for the p-body (n-channel) devices and negative fixed charges increase for the n-body (p-channel) devices, both of which retard the increase of threshold voltage in MOSFETs with increasing the body doping.

Publication Details

Journal
Kyoto University Research Information Repository (Kyoto University)
Published
2025-03-01
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
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article

Doping-dependent fixed charges in SiC/SiO₂ structure

Kyoto University Research Information Repository (Kyoto University)
Silicon Carbide Semiconductor Technologies
article

Doping-dependent fixed charges in SiC/SiO₂ structure

article en

Abstract

Doping-dependent fixed charges were found in SiC/SiO₂ structures through a study on threshold voltage in both n- and p-channel SiC metal-oxide-semiconductor field-effect transistors (MOSFETs) with various body doping concentrations. Positive fixed charges increase for the p-body (n-channel) devices and negative fixed charges increase for the n-body (p-channel) devices, both of which retard the increase of threshold voltage in MOSFETs with increasing the body doping.

Kyoto University Research Information Repository (Kyoto University)
Openalex Percentile: Top 45%
Silicon Carbide Semiconductor Technologies
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