Direct Laser Writing of Subwavelength Microstructures in the Bulk of Fused Silica by Tightly Focused Laser Pulses (Brief Review)

The laser writing of microstructures in the bulk of fused silica exposed to tightly focused laser pulses has been analyzed in detail. The self-consistent simulation of a single laser pulse exposure and the formation of electron–hole plasma together with the experimental data has made it possible to verify the mechanism of plasma self-organization and relate it to the mechanisms of defect accumulation in dense plasma regions under multipulse exposure. The dependence of the parameters of the induced microstructures on the wavelength, duration, energy, and exposure of the laser pulse has been investigated. The role of plasma-electron-induced defocusing effects, as well as the contribution of radiation self-focusing, has been analyzed. The heating of the material by the end of the laser pulse has been estimated.