On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma

A model study of the composition of the neutral component of plasma in CHF3 + O2, CHF3 + CO and CHF3 + CO2 mixtures was conducted under conditions of an inductive 13.56 MHz discharge excited at a constant pressure (6 mTorr) and input power (700 W). It is shown that the influence of CO and CO2 additives differs significantly from the classical effect of oxygen, which is accompanied by a sharp increase in chemical activity and a decrease in the polymerization capacity of the plasma. The reliability of the obtained data is confirmed by satisfactory agreement between the calculated concentrations of fluorine atoms and the results of the actinometric experiment.

Institutions

Publication Details

Journal
Russian Microelectronics
Published
2025-10-01
DOI
https://doi.org/10.1134/s1063739725600633
Primary Topic
Plasma Applications and Diagnostics
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma

Russian Microelectronics
Plasma Applications and Diagnostics
article

On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma

article en

Abstract

A model study of the composition of the neutral component of plasma in CHF3 + O2, CHF3 + CO and CHF3 + CO2 mixtures was conducted under conditions of an inductive 13.56 MHz discharge excited at a constant pressure (6 mTorr) and input power (700 W). It is shown that the influence of CO and CO2 additives differs significantly from the classical effect of oxygen, which is accompanied by a sharp increase in chemical activity and a decrease in the polymerization capacity of the plasma. The reliability of the obtained data is confirmed by satisfactory agreement between the calculated concentrations of fluorine atoms and the results of the actinometric experiment.

Russian MicroelectronicsVol. 54(5)
Korea University (KR), Kurchatov Institute (RU), Research Institute of Molecular Electronics (RU)
Clean water and sanitation
Openalex Percentile: Top 35%
Plasma Applications and Diagnostics
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma · Russian Microelectronics (2025) | TGRS Research Map | TGRS