Experimental Investigation and Behavioral Modeling of the Ron vs. Gate Overshoots Relationship in Schottky p-GaN HEMTs

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Publication Details

Journal
HAL (Le Centre pour la Communication Scientifique Directe)
Published
2025-11-10
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

Experimental Investigation and Behavioral Modeling of the Ron vs. Gate Overshoots Relationship in Schottky p-GaN HEMTs

HAL (Le Centre pour la Communication Scientifique Directe)
GaN-based semiconductor devices and materials
article

Experimental Investigation and Behavioral Modeling of the Ron vs. Gate Overshoots Relationship in Schottky p-GaN HEMTs

article en

Abstract

No abstract available for this paper.
HAL (Le Centre pour la Communication Scientifique Directe)
Université Toulouse III - Paul Sabatier (FR), Laboratoire d'Analyse et d'Architecture des Systèmes (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), Direction de la Recherche Technologique (FR)
Openalex Percentile: Top 36%
GaN-based semiconductor devices and materials
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Experimental Investigation and Behavioral Modeling of the Ron vs. Gate Overshoots Relationship in Schottky p-GaN HEMTs · HAL (Le Centre pour la Communication Scientifique Directe) (2025) | TGRS Research Map | TGRS