UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmas
Institutions
Centre National de la Recherche Scientifique (FR)
Laboratoire des Technologies de la Microélectronique (FR)
Groupe de Recherches sur l'Energétique des Milieux Ionisés (FR)
Publication Details
Journal
SPIRE - Sciences Po Institutional REpository
Published
2025-10-27
Primary Topic
Fetal and Pediatric Neurological Disorders
Type
article
Field-Weighted Citation Impact
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article
UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF4 plasmas
Journal
SPIRE - Sciences Po Institutional REpository
Topics
Fetal and Pediatric Neurological Disorders
article
UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF4 plasmas
article en
Abstract
No abstract available for this paper.
Publication Tag
SPIRE - Sciences Po Institutional REpository
Institutions
Centre National de la Recherche Scientifique (FR), Laboratoire des Technologies de la Microélectronique (FR), Groupe de Recherches sur l'Energétique des Milieux Ionisés (FR)
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UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmas · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS