Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation

Publication Details

Journal
SPIRE - Sciences Po Institutional REpository
Published
2025-06-17
Primary Topic
Advancements in Photolithography Techniques
Type
article
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article

Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation

SPIRE - Sciences Po Institutional REpository
Advancements in Photolithography Techniques
article

Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation

article en

Abstract

No abstract available for this paper.
SPIRE - Sciences Po Institutional REpository
Openalex Percentile: Top 49%
Advancements in Photolithography Techniques
Open Access PDFOpenAlex
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Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation · SPIRE - Sciences Po Institutional REpository (2025) | TGRS Research Map | TGRS