A W-Band Broadband and High Gain Patch Antenna Using Dry Film Micromaching

A W-band broadband and high gain patch antenna using dry film micromaching is proposed. Benefiting from the stacked patch method and loading the interdigital capacitor, the proposed antenna operates in the frequency range of 79–120GHz and achieves a high gain of approximately 9.11 dBi. The antenna can be fabricated by our in-house silicon-based MEMS photosensitive composite film fabrication process by using the SUEX dry film. The SUEX dry film offers a amount of benefits, such as fewer processing steps, shorter prototyping time over existing CMOS techniques. The corresponding fabrication process is presented in detail. Additionally, the proposed antenna can be further 3D heterogeneously integrated with other components, because of low interconnection loss to enhance high-frequency performance for future millimeter wave radar and communication systems.