Deterministic Detection of Single Ion Implantation

Single ion implantation using focused ion beam systems enables high spatial resolution and maskless doping for rapid and scalable engineering of materials for quantum technologies, particularly qubits and colour centres in solid-state hosts. In such applications, the confidence with which a single ion can be deterministically implanted is crucial, and so the efficiency of the detection mechanism is a vital parameter. Here, we present a study of the single-ion detection efficiency for a variety of ion species (Si, P, Mn, Co, Ge, Sb, Au and Bi) into various hosts (Si, SiO2, Al2O3, GaAs, diamond and SiC). The effect of varying ion mass, charge and kinetic energy are studied, in addition to the cluster implantation of Sb, Au and Bi. We demonstrate that it is possible to achieve detection efficiencies >90% for a wide range of ion species and substrate combination through selection of the implantation parameters. Furthermore, detection efficiencies of 100% are found for the doping of Sb clusters which is of direct relevance for the future fabrication of quantum devices.