Optimization of Deposition Parameters for Thin-Film Semiconductor Structures via Spray Pyrolysis

The paper studies the optimization of deposition parameters for thin-film semiconductor structures obtained by spray pyrolysis. The main stages of the process are described, including aerosol formation, aerosol transfer to the substrate, thermal decomposition of precursors, and film crystallization. Physicochemical processes affecting the coating characteristics, such as solvent evaporation, thermal decomposition of precursors, and diffusion film growth, are considered. Transparent conductive oxides were obtained on the developed information-measuring and control system. Promising materials and their impurities for producing transparent conductive oxides by spray pyrolysis are considered. Precursors to oxide materials and their concentration were also selected. The effect of process parameters (substrate temperature, solution composition, carrier gas pressure, and deposition time) on the morphology, crystal structure, and electrophysical properties of transparent conducting oxides ZnO, SnO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>, and 1203-SnO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> (ITO) is analyzed. The results show that control of deposition parameters can improve the quality of coatings, making the spray pyrolysis method promising for use in microelectronics, sensors, and photovoltaics.