Growth and Morphological changes of Two-dimensional Carbon nanostructures with time of Deposition by Radio Frequency Plasma Enhanced Chemical vapor deposition

In this work, we report the growth of different types of two-dimensional(2D) carbon nanostructures and their change in the morphology, growth and size on Si substrate with deposition time. The 2D carbon nanostructure were grown in the presence of Argon plasma with Methane as a carbon source without any special pre-treatment of the substrate using Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF-PECVD). Field Emission Scanning Electron Microscopy (FE-SEM) and Atomic Force Microscopy (AFM) were proven the grown carbon nanostructures were hexagonal Islands, rod shaped and white patches like structures. We identified the changes in the diameters of the grown nanostructures from 35-130 nm with deposition times 30 to 120 minutes. The surface roughness of the samples was reported by the 3D analysis of AFM. The presence of D and G peaks was identified by Raman Spectroscopy. Raman spectroscopy showed that the ratio of I(D)/I(G) increases with increasing deposition time.