Characterization of the single-event effect induced by heavy ions in 12-nm bulk FinFET SRAM using self-developed automatic particle beam adjusting equipment

A novel equipment which can automatically adjust the LET value of incident heavy ions in irradiation experiments is proposed and implemented in this paper. Based on a commercial 12-nm FinFET SRAM, the dependence of voltage supply on the single-event upset (SEU) sensitivity is studied by experiments using heavy ions with a wide range of effective linear energy transfer (LET) value from 0.476 MeV•cm2/mg to 85.59 MeV•cm2/mg. The results show that at advanced FinFET technology, the SEU cross section increases exponentially with the decrease of supply voltage. Furthermore, single-event hard errors (SEHE) was detected in the 12-nm FinFET technology for the first time.

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Publication Details

Journal
IEICE Electronics Express
Published
2025-09-25
DOI
https://doi.org/10.1587/elex.22.20250529
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
0.00

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article

Characterization of the single-event effect induced by heavy ions in 12-nm bulk FinFET SRAM using self-developed automatic particle beam adjusting equipment

IEICE Electronics Express
Geochemistry and Geologic Mapping
article

Characterization of the single-event effect induced by heavy ions in 12-nm bulk FinFET SRAM using self-developed automatic particle beam adjusting equipment

article en

Abstract

A novel equipment which can automatically adjust the LET value of incident heavy ions in irradiation experiments is proposed and implemented in this paper. Based on a commercial 12-nm FinFET SRAM, the dependence of voltage supply on the single-event upset (SEU) sensitivity is studied by experiments using heavy ions with a wide range of effective linear energy transfer (LET) value from 0.476 MeV•cm2/mg to 85.59 MeV•cm2/mg. The results show that at advanced FinFET technology, the SEU cross section increases exponentially with the decrease of supply voltage. Furthermore, single-event hard errors (SEHE) was detected in the 12-nm FinFET technology for the first time.

IEICE Electronics ExpressVol. 22(22)
Northwest Institute of Nuclear Technology (CN), Nanjing University of Aeronautics and Astronautics (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 28%
Geochemistry and Geologic Mapping
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