High-Performance H-Diamond MOSFETs With HAO as Gate Dielectrics

This work presents the design and characterization of high-performance hydrogen-terminated diamond (H-diamond) MOSFETs utilizing Al-doped HfO2 (HAO) as the gate dielectric. A 15-nm HAO layer with a Hf-to-Al ratio of 16:1 was deposited at 250 °C on a single-crystal diamond substrate, achieving a dielectric constant of 20.2 and a gate oxide capacitance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {C}_{\text {ox}}$ </tex-math></inline-formula>) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.19 \; \mu $ </tex-math></inline-formula>F/cm2. Two MOSFETs were fabricated and evaluated: one with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.8 \; \mu $ </tex-math></inline-formula>m and a channel length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$13 \; \mu $ </tex-math></inline-formula>m and another with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.4 \; \mu $ </tex-math></inline-formula>m and a channel length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10 \; \mu $ </tex-math></inline-formula>m. The devices exhibit a high breakdown electric field of 14.33 MV/cm and a low gate leakage current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {J}_{\textit {G}}$ </tex-math></inline-formula>) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.57 \times $ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{-7}$ </tex-math></inline-formula> A/cm2 at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {V}_{\text {GS}}$ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$ = -5$ </tex-math></inline-formula> V, indicating ultralow gate leakage during operation. The output characteristics show a high <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on/off</small> switching ratio of approximately 108 across a 3.5-V gate voltage swing, making these devices attractive for practical applications.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2025-09-12
DOI
https://doi.org/10.1109/ted.2025.3606423
Primary Topic
Geochemistry and Geologic Mapping
Type
article
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High-Performance H-Diamond MOSFETs With HAO as Gate Dielectrics

IEEE Transactions on Electron Devices
Geochemistry and Geologic Mapping
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High-Performance H-Diamond MOSFETs With HAO as Gate Dielectrics

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Abstract

This work presents the design and characterization of high-performance hydrogen-terminated diamond (H-diamond) MOSFETs utilizing Al-doped HfO2 (HAO) as the gate dielectric. A 15-nm HAO layer with a Hf-to-Al ratio of 16:1 was deposited at 250 °C on a single-crystal diamond substrate, achieving a dielectric constant of 20.2 and a gate oxide capacitance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {C}_{\text {ox}}$ </tex-math></inline-formula>) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.19 \; \mu $ </tex-math></inline-formula>F/cm2. Two MOSFETs were fabricated and evaluated: one with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.8 \; \mu $ </tex-math></inline-formula>m and a channel length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$13 \; \mu $ </tex-math></inline-formula>m and another with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.4 \; \mu $ </tex-math></inline-formula>m and a channel length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10 \; \mu $ </tex-math></inline-formula>m. The devices exhibit a high breakdown electric field of 14.33 MV/cm and a low gate leakage current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {J}_{\textit {G}}$ </tex-math></inline-formula>) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.57 \times $ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{-7}$ </tex-math></inline-formula> A/cm2 at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\textit {V}_{\text {GS}}$ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$ = -5$ </tex-math></inline-formula> V, indicating ultralow gate leakage during operation. The output characteristics show a high <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on/off</small> switching ratio of approximately 108 across a 3.5-V gate voltage swing, making these devices attractive for practical applications.

IEEE Transactions on Electron DevicesVol. 72(11)
Peking University (CN), Fudan University (CN), Shanghai Advanced Research Institute (CN), Robotics Research (United States) (US), Shanghai Fudan Microelectronics (China) (CN)
Affordable and clean energy
Openalex Percentile: Top 38%
Geochemistry and Geologic Mapping
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