Supplemental Material

Figure S1 shows high-resolution spectra for N 1s, O1s and Si 2p for a SiNx etched in C4F6/O2/Ar plasmas with different O2 to C4F6 flow rate ratios at 70 and 120 {degree sign}C. Figure S2 shows the infrared spectra for CFx film deposited on bare ZnSe and plasma-deposited SiNx surfaces at different substrate temperatures.

Publication Details

Journal
AIP Publishing
Published
2025-09-03
DOI
https://doi.org/10.60893/figshare.jva.29910962
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
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Supplemental Material

AIP Publishing
Geochemistry and Geologic Mapping
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Supplemental Material

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Abstract

Figure S1 shows high-resolution spectra for N 1s, O1s and Si 2p for a SiNx etched in C4F6/O2/Ar plasmas with different O2 to C4F6 flow rate ratios at 70 and 120 {degree sign}C. Figure S2 shows the infrared spectra for CFx film deposited on bare ZnSe and plasma-deposited SiNx surfaces at different substrate temperatures.

AIP Publishing
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Geochemistry and Geologic Mapping
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