31‐1: <i>Invited Paper:</i> High‐Uniformity Full‐Color Waveguides Fabricated by Nanoimprint Lithography for Near‐Eye Display

Surface relief gratings offer the advantages of well‐defined structure and can be mass produced using Nanoimprint Lithography (NIL). In this article, we propose an optimal folding partition design and fabricate a waveguide using NIL. After prototyping, we achieved a full‐color waveguide delivering up to 880 nits/lumen and high uniformity, demonstrating its potential for applications in AR glasses.