P‐79: New Applications of Optical Proximity Correction (OPC) Technology in the Display Industry

This article introduces two new application cases of Optical Proximity Correction (OPC) technology in display backboards. The first method is to use OPC technology on the mask template layout to solve the Mura defect problem caused by diffraction induced exposure increase during the splicing process of the Over Coat (OC) layer mask template. After simulating the exposure energy curve of the spliced Aerial image and correcting the graph using Aerial image simulation and OPC technology, the Mura defect problem was successfully solved.Another approach is to replace halftone technology with OPC technology, which enables the synthesis of Pixel Define Layer (PDL) and Photo Spacer (PS) into a single mask. The same layer of Resin adhesive is used to achieve a two‐layer film structure, saving production costs.