P‐149: Monolithic Integration of <i>p</i> ‐type MOSFET and MicroLEDs for AR/VR/XR Display
We report a monolithically integrated voltagecontrolled p‐ type metal‐oxide‐semiconductor field effect transistor (p‐MOSFET)‐Micro‐LED device based on commercial GaN LED epitaxial wafer. By adjusting the Gate voltage, the effective control of Micro‐LED injection current is realized. The I ds on/off ratio is around 10 4 , and the gate leakage current (I gs ) remains below 10 ‐9 A as V gs increases up to ‐25 V.
Institutions
- Southern University of Science and Technology (CN)
Publication Details
- Journal
- SID Symposium Digest of Technical Papers
- Published
- 2025-06-01
- DOI
- https://doi.org/10.1002/sdtp.18612
- Primary Topic
- Geochemistry and Geologic Mapping
- Type
- article
- Field-Weighted Citation Impact
- 0.00