47‐1: Triple‐Nozzle Revolving Evaporation Source for RGB Direct Patterning OLEDoS Mass Production

Triple nozzle can concentrate deposition materials within ±10° deposition angle region and can make under 0.3µm mask shadow. We have developed the triple nozzle revolving source that arrange multiple triple nozzles with appropriate 2‐dimensional layout on plane source. And, by rotating the source during deposition, it can make good film thickness uniformity and good mixing homogeneity. Also, it can achieve material utilization about 30% and long continuous operation time over 200hrs because the collimator that block low angle particles is not needed. We expect that this technology will make a significant contribution to the mass production of RGB pattern OLEDoS.