12‐2: Ultra‐High‐Resolution Active‐Matrix NanoLED Microdisplay by UV Photolithography

We report and discuss the challenges to realize ultra‐highresolution NanoLED on Si CMOS backplane. Quantum dot layers are patterned side‐by‐side by UV photolithography. We demonstrate a full‐color 1.03 inch active‐matrix NanoLED microdisplay with pixel density of 3,528 ppi and a wide color gamut over 120 % as a ratio to DCI‐P3. This is the world's highest resolution self‐emitting active‐matrix device created by patterning red, green, and blue quantum dots.

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18104
Citations
2
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
4.96
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article

12‐2: Ultra‐High‐Resolution Active‐Matrix NanoLED Microdisplay by UV Photolithography

2 citations
SID Symposium Digest of Technical Papers
Geochemistry and Geologic Mapping
4.96
article

12‐2: Ultra‐High‐Resolution Active‐Matrix NanoLED Microdisplay by UV Photolithography

article en
2 citations

Abstract

We report and discuss the challenges to realize ultra‐highresolution NanoLED on Si CMOS backplane. Quantum dot layers are patterned side‐by‐side by UV photolithography. We demonstrate a full‐color 1.03 inch active‐matrix NanoLED microdisplay with pixel density of 3,528 ppi and a wide color gamut over 120 % as a ratio to DCI‐P3. This is the world's highest resolution self‐emitting active‐matrix device created by patterning red, green, and blue quantum dots.

SID Symposium Digest of Technical PapersVol. 56(1)
National Archives and Records Administration (US), Willow Wood (United States) (US)
Openalex Percentile: Top 4%
Geochemistry and Geologic Mapping
4.96
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