P‐159: High Performance, Flexible Ferroelectric Thin Film Transistor on PI Substrate

We present flexible ferroelectric HZO TFTs on polyimide (PI) substrate, with a nanocrystalline IGZO active semiconductor. The TFTs exhibit stabilized ferroelectricity at 350 °C, anticlockwise hysteresis with memory window (MW) of ~5 V, subthreshold swing (SS) of 120 mV/decade, and ION/IOFF ratio of ~8.9×10 6 . The MW of the flexible FE‐TFTs changes a little upon mechanical bending strain (MBS) of 0.32% at 2 mm radius.

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18631
Citations
1
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
2.48

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article

P‐159: High Performance, Flexible Ferroelectric Thin Film Transistor on PI Substrate

1 citations
SID Symposium Digest of Technical Papers
Geochemistry and Geologic Mapping
2.48
article

P‐159: High Performance, Flexible Ferroelectric Thin Film Transistor on PI Substrate

article en
1 citations

Abstract

We present flexible ferroelectric HZO TFTs on polyimide (PI) substrate, with a nanocrystalline IGZO active semiconductor. The TFTs exhibit stabilized ferroelectricity at 350 °C, anticlockwise hysteresis with memory window (MW) of ~5 V, subthreshold swing (SS) of 120 mV/decade, and ION/IOFF ratio of ~8.9×10 6 . The MW of the flexible FE‐TFTs changes a little upon mechanical bending strain (MBS) of 0.32% at 2 mm radius.

SID Symposium Digest of Technical PapersVol. 56(1)
University of Barishal (BD), Kyung Hee University (KR), Jagannath University (BD)
National Research Foundation, National Research Foundation of Korea
Affordable and clean energy
Openalex Percentile: Top 7%
Geochemistry and Geologic Mapping
2.48
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