62‐3: <i>Invited Paper:</i> High‐Mobility Metal‐Oxide TFT Development for IT AMOLED Applications

In this paper, we demonstrated the high mobility metal oxide TFTs with small Vth variation and good electrical reliability in Gen. 6 and Gen. 4.5 factory. Moreover, The 13.2 and 12.6 inch AMOLED displays have been successfully developed with MO‐1 and MO‐2 backplane technology, respectively. Furthermore, the MO‐3 metal oxide TFTs were fabricated with high mobility (55 cm 2 /Vs) by using atom layer deposition (ALD) technology.

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18299
Primary Topic
Theoretical and Computational Physics
Type
article
Field-Weighted Citation Impact
0.00
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article

62‐3: Invited Paper: High‐Mobility Metal‐Oxide TFT Development for IT AMOLED Applications

SID Symposium Digest of Technical Papers
Theoretical and Computational Physics
article

62‐3: Invited Paper: High‐Mobility Metal‐Oxide TFT Development for IT AMOLED Applications

article en

Abstract

In this paper, we demonstrated the high mobility metal oxide TFTs with small Vth variation and good electrical reliability in Gen. 6 and Gen. 4.5 factory. Moreover, The 13.2 and 12.6 inch AMOLED displays have been successfully developed with MO‐1 and MO‐2 backplane technology, respectively. Furthermore, the MO‐3 metal oxide TFTs were fabricated with high mobility (55 cm 2 /Vs) by using atom layer deposition (ALD) technology.

SID Symposium Digest of Technical PapersVol. 56(1)
Kunshan Govisionox Optoelectronic (China) (CN), Vision Technology (United States) (US)
Industry, innovation and infrastructure
Openalex Percentile: Top 44%
Theoretical and Computational Physics
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62‐3: <i>Invited Paper:</i> High‐Mobility Metal‐Oxide TFT Development for IT AMOLED Applications · SID Symposium Digest of Technical Papers (2025) | TGRS Research Map | TGRS