54‐1: <i>Invited Paper:</i> Amorphous p‐Channel Tellurium Oxide Transistors

This presentation discusses high‐performance p‐type oxide semiconductors for thin‐film transistors (TFTs). It highlights selenium‐alloyed tellurium in a tellurium sub‐oxide matrix, demonstrating stable p‐channel TFTs with high mobility (10~15 cm 2 /V·s), on/off ratios (10 6 –10 7 ), and long‐term stability, driven by delocalized valence bands and selenium alloying for enhanced transport.

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18267
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
0.00
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article

54‐1: Invited Paper: Amorphous p‐Channel Tellurium Oxide Transistors

SID Symposium Digest of Technical Papers
Geochemistry and Geologic Mapping
article

54‐1: Invited Paper: Amorphous p‐Channel Tellurium Oxide Transistors

article en

Abstract

This presentation discusses high‐performance p‐type oxide semiconductors for thin‐film transistors (TFTs). It highlights selenium‐alloyed tellurium in a tellurium sub‐oxide matrix, demonstrating stable p‐channel TFTs with high mobility (10~15 cm 2 /V·s), on/off ratios (10 6 –10 7 ), and long‐term stability, driven by delocalized valence bands and selenium alloying for enhanced transport.

SID Symposium Digest of Technical PapersVol. 56(1)
Pohang University of Science and Technology (KR), Korea Post (KR)
Openalex Percentile: Top 70%
Geochemistry and Geologic Mapping
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54‐1: <i>Invited Paper:</i> Amorphous p‐Channel Tellurium Oxide Transistors · SID Symposium Digest of Technical Papers (2025) | TGRS Research Map | TGRS