70‐1: <i>Invited Paper:</i> Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels beyond PVD: Material, Devices, and M3D Stacked Structures

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18327
Primary Topic
Geochemistry and Geologic Mapping
Type
article
Field-Weighted Citation Impact
0.00
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article

70‐1: Invited Paper: Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels beyond PVD: Material, Devices, and M3D Stacked Structures

SID Symposium Digest of Technical Papers
Geochemistry and Geologic Mapping
article

70‐1: Invited Paper: Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels beyond PVD: Material, Devices, and M3D Stacked Structures

article en

Abstract

No abstract available for this paper.
SID Symposium Digest of Technical PapersVol. 56(1)
Hanyang University (KR)
Openalex Percentile: Top 70%
Geochemistry and Geologic Mapping
DOISourceOpenAlex
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70‐1: <i>Invited Paper:</i> Challenges of Atomic‐Layer‐Deposited Oxide Semiconductor Channels beyond PVD: Material, Devices, and M3D Stacked Structures · SID Symposium Digest of Technical Papers (2025) | TGRS Research Map | TGRS