4‐4: Finetuning the Microstructure of Metal‐Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT

Films of Molybdenum‐ and Tungsten‐Oxides are used as low reflection dark layers to cover thin metal line as well as high work‐function materials. Due to their nature as sub stoichiometric oxides with composition tailored to specific applications, sputter targets used in the process compose of different material phases on the micrometer scale. We study the impact of microstructure on the sputter behavior.

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Publication Details

Journal
SID Symposium Digest of Technical Papers
Published
2025-06-01
DOI
https://doi.org/10.1002/sdtp.18075
Primary Topic
Prenatal Screening and Diagnostics
Type
article
Field-Weighted Citation Impact
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article

4‐4: Finetuning the Microstructure of Metal‐Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT

SID Symposium Digest of Technical Papers
Prenatal Screening and Diagnostics
article

4‐4: Finetuning the Microstructure of Metal‐Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT

article en

Abstract

Films of Molybdenum‐ and Tungsten‐Oxides are used as low reflection dark layers to cover thin metal line as well as high work‐function materials. Due to their nature as sub stoichiometric oxides with composition tailored to specific applications, sputter targets used in the process compose of different material phases on the micrometer scale. We study the impact of microstructure on the sputter behavior.

SID Symposium Digest of Technical PapersVol. 56(1)
Franklin Institute (US), Plansee (Austria) (AT)
Openalex Percentile: Top 33%
Prenatal Screening and Diagnostics
DOISourceOpenAlex
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4‐4: Finetuning the Microstructure of Metal‐Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT · SID Symposium Digest of Technical Papers (2025) | TGRS Research Map | TGRS