Coercive Field Control in Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films by Nanostructure Engineering.

Publication Details

Journal
Apollo (University of Cambridge)
Published
2024-12-11
Primary Topic
High-pressure geophysics and materials
Type
article
Field-Weighted Citation Impact
0.00

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Coercive Field Control in Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films by Nanostructure Engineering.

Apollo (University of Cambridge)
High-pressure geophysics and materials
article

Coercive Field Control in Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films by Nanostructure Engineering.

article en

Abstract

No abstract available for this paper.
Apollo (University of Cambridge)
National Science Foundation, Purdue University, Samsung Advanced Institute of Technology, Royal Academy of Engineering, European Commission, Ministério da Ciência, Tecnologia e Ensino Superior, Samsung, Centro de Investigação em Materiais Cerâmicos e Compósitos, Horizon 2020 Framework Programme, HORIZON EUROPE Framework Programme, Engineering and Physical Sciences Research Council, Trinity College, University of Cambridge, Fundação para a Ciência e a Tecnologia, Department of Materials Science and Metallurgy, University of Cambridge, Division of Materials Research, HORIZON EUROPE Marie Sklodowska-Curie Actions
Affordable and clean energy
Openalex Percentile: Top 48%
High-pressure geophysics and materials
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.