СУЧАСНІ ДОСЛІДЖЕННЯ В РОЗРОБЦІ ТЕХНОЛОГІЙ ДОВЕДЕННЯ ТА ПОЛІРУВАННЯ ДЛЯ ОДЕРЖАННЯ ВИСОКОЯКІСНИХ ПОВЕРХОНЬ (ОГЛЯД)

Modern research indicates the effectiveness of using abrasive and chemical-mechanical methods in polishing, taking into account the characteristics of the abrasives used. At the same time, for chemical-mechanical polishing (CMP), researchers consider two directions: the influence of different abrasives, i.e., emphasis on the mechanical component of CMP, and the influence of suspension, i.e., emphasis on the chemical component. As an abrasive for polishing, diamonds are used in the tool in the form of metallic Cu6Sn5 and polymer diamond film overlays, as well as with the use of a mixed abrasive suspension of cerium and diamond. The features of polishing Al2O3–SiO2 with mixed particles and pure – SiO2, as well as new abrasives of the core-shell type SiO2@A-TiO2 are separately considered. In new suspensions containing Fe, Al2O3, a new material is added - graphene oxide (GO), and deionized water is also used in CMP, and this is a certain modern research trend.