Evaluating Plasma Etching for Graphene Fabrication: Etch Rate Control and Flake Characterization

Graphene, a two-dimensional material composed of a single layer of carbon atoms arranged in a hexagonal lattice, has attracted significant attention due to its exceptional mechanical, electrical, and thermal properties. Mechanical exfoliation is one of the most reliable methods for producing high-quality graphene flakes. However, its lack of scalability limits its application in industrial contexts. This thesis explores plasma etching as an alternative approach for controllable and scalable graphene production, by etching thicker graphite flakes into single-layer graphene.