Strain-induced modifications of thin film silicon membranes by physical bending

Silicon, being the fundamental material for modern semiconductor devices, has seen continuous advancements to enhance its electrical and mechanical properties. Strain engineering is a well-established technique for improving the performance of silicon-based devices. In this paper, we propose a simple method for inducing and permanently maintaining strain in silicon through pure physical bending. By subjecting the silicon substrate to a controlled bending process, we demonstrate the generation of strain levels that persist even after the removal of external stress, with a maximum strain value of 0.4%. We present a comprehensive study of the mechanics behind this phenomenon, a full finite element mechanical model, and experimental verification of the bending-induced strain in Si membranes using electron backscatter diffraction measurements. Our findings show the potential of this approach for strain engineering in high-performance silicon-based technologies without resorting to complex and expensive fabrication techniques.