Assessing the performance and capabilities of an ultra-low energy implanter

Low-energy ions are becoming more frequently employed for near-surface modification of materials, in simulating the effect of the fusion plasma on structural components, and in tailoring the electronic properties of 2D materials. The ultra-low energy ion implanter (LEION) is a new setup at the Tandem Laboratory to initiate studies on a range of industrially relevant materials science questions. The ion source of LEION can generate both light and heavy ion-species, extracted from gaseous or solid media, and with variable charge states. LEION was experimentally validated and successfully implanted N, P, H, and D into multiple targets, demonstrating its versatility. The samples were then analyzed using Time of Flight Elastic Recoil Detection Analysis (ToF-ERDA), Rutherford Backscattering Spectrometry (RBS), and Nuclear Reaction Analysis (NRA), and then a comparison between predicted and measured parameters were conducted. Since this infrastructure was in a pre-commission phase of development, systematic characterization was necessary to fully assess its capabilities and guide further development.