STUDY OF THE EFFECT OF THERMAL TREATMENT OF Mn4Si7 AND CoSi2 THIN FILMS USING AN INFRARED LAMP IN A HIGH-TEMPERATURE FURNACE IN INERT GAS ENVIRONMENTS (Ar, Kr, Xe) ON THEIR CRYSTAL STRUCTURE

This study describes the modification of a high-temperature RTP-100 furnace. This furnace is equipped with a turbomolecular pump capable of achieving a vacuum level down to 10⁻⁴ Pa. It is designed for heating thin films of Mn₄Si₇ and CoSi₂ with a thickness of ≤ 0.7 μm in a vacuum or inert gas atmospheres such as Ar, Kr, and Xe. The heating zone measures 100×100 mm. The new furnace design enables vacuum thermal processing of Mn₄Si₇ and CoSi₂ coatings applied to Si, SiO₂/Si, and ZrO₂/Si substrates with diameters up to 60 mm in batch mode. Heating is carried out using infrared (IR) lamps. The development of this tubular high-vacuum furnace design is both scientifically and technologically justified. Key technical specifications of the furnace are as follows: Heating system: 24 IR lamps with a total power of 21 kVA, Power supply: 3×32 A, 230 V, 3-phase, Maximum heating temperature: 1473 K, Maximum heating rate: 150 K/s, Vacuum level: 10⁻⁴ Pa, Temperature profile: programmable, Control system: microcontroller + touchscreen, Dimensions: 505×504×580 mm Weight: 70 kg