Significance of Annealing Temperature on Transmission Properties of ZnO Thin Film by Hydrothermal Method

In this study Zinc oxide (ZnO) thin films were prepared using a low cost hydrothermal method and investigated for the effect of different annealing temperatures. The ZnO precursor solution was made using zinc acetate dehydrate Zn(CH3COO)2.2H2O (ZAD) and hexamethylenetetramine C6H12N4(HMT). The samples were annealed at different temperatures (100°C, 200°C, 300°C, 400°C & 500°C) for 90 minutes and irradiated using refractory furnace. Thin films were analyzed using ultra violet-visible spectrophotometry, X-ray Diffraction (XRD) with Cu-Kα radiation to determine the structure of the film, four probe and two probe method for electrical properties and Scanning Electron Microscopy (SEM) with Energy Dispersive X-ray Spectroscopy (EDX) for surface morphology and chemical composition. Result shows the 500°C annealing produce good thin films as well as the increasing deposition time from 4 to 24 hours leads to higher crystalline films with increased transmittance.

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Publication Details

Journal
Zenodo (CERN European Organization for Nuclear Research)
Published
2025-07-23
DOI
https://doi.org/10.5281/zenodo.16341177
Primary Topic
ZnO doping and properties
Type
article
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article

Significance of Annealing Temperature on Transmission Properties of ZnO Thin Film by Hydrothermal Method

Zenodo (CERN European Organization for Nuclear Research)
ZnO doping and properties
article

Significance of Annealing Temperature on Transmission Properties of ZnO Thin Film by Hydrothermal Method

article en

Abstract

In this study Zinc oxide (ZnO) thin films were prepared using a low cost hydrothermal method and investigated for the effect of different annealing temperatures. The ZnO precursor solution was made using zinc acetate dehydrate Zn(CH3COO)2.2H2O (ZAD) and hexamethylenetetramine C6H12N4(HMT). The samples were annealed at different temperatures (100°C, 200°C, 300°C, 400°C & 500°C) for 90 minutes and irradiated using refractory furnace. Thin films were analyzed using ultra violet-visible spectrophotometry, X-ray Diffraction (XRD) with Cu-Kα radiation to determine the structure of the film, four probe and two probe method for electrical properties and Scanning Electron Microscopy (SEM) with Energy Dispersive X-ray Spectroscopy (EDX) for surface morphology and chemical composition. Result shows the 500°C annealing produce good thin films as well as the increasing deposition time from 4 to 24 hours leads to higher crystalline films with increased transmittance.

Zenodo (CERN European Organization for Nuclear Research)
Directorate of Medicinal and Aromatic Plants Research (IN)
Openalex Percentile: Top 61%
ZnO doping and properties
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Significance of Annealing Temperature on Transmission Properties of ZnO Thin Film by Hydrothermal Method · Zenodo (CERN European Organization for Nuclear Research) (2025) | TGRS Research Map | TGRS