Temperature Dependence of Heavy-Ion-Induced Leakage Current in SiC Power MOSFETs

Temperature dependence of the heavy-ion-induced leakage current in silicon carbide (SiC) power MOSFETs has been studied. The devices exhibit an order of magnitude lower degradation rate for drain current at elevated temperatures compared to the values measured at room temperature. The degradation rates at different drain voltages and different temperatures were determined. The effect of temperature on the degradation of device parameters is presented, and the degradation mechanisms and implications to the power applications in radiation environments are discussed.

Publication Details

Journal
Repository for Publications and Research Data (ETH Zurich)
Published
2025-04-01
DOI
https://doi.org/10.3929/ethz-b-000733880
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
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article

Temperature Dependence of Heavy-Ion-Induced Leakage Current in SiC Power MOSFETs

Repository for Publications and Research Data (ETH Zurich)
Silicon Carbide Semiconductor Technologies
article

Temperature Dependence of Heavy-Ion-Induced Leakage Current in SiC Power MOSFETs

article en

Abstract

Temperature dependence of the heavy-ion-induced leakage current in silicon carbide (SiC) power MOSFETs has been studied. The devices exhibit an order of magnitude lower degradation rate for drain current at elevated temperatures compared to the values measured at room temperature. The degradation rates at different drain voltages and different temperatures were determined. The effect of temperature on the degradation of device parameters is presented, and the degradation mechanisms and implications to the power applications in radiation environments are discussed.

Repository for Publications and Research Data (ETH Zurich)
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Temperature Dependence of Heavy-Ion-Induced Leakage Current in SiC Power MOSFETs · Repository for Publications and Research Data (ETH Zurich) (2025) | TGRS Research Map | TGRS