Thermal Performance Differences Between Ceramic Packages and Lead Frame Packages for Dr.MOS

This study evaluates the thermal performance of Lead Frame, Al₂O₃ Direct-Plated Copper (DPC) Ceramic, and AlN DPC Ceramic packages in Driver-MOSFET(Dr.MOS) devices. Experimental measurements at 12V and 19V under current loads of 0A–40A, along with ICEPAK simulations, confirm that the AlN DPC Ceramic package achieves the lowest thermal resistance (Rthjc = 1.48 K/W) and temperature rise (120.7°C at 19V, 40A). The Lead Frame package exhibits moderate thermal performance (Rthjc = 2.61 K/W, 144.6°C), while the Al₂O₃ DPC Ceramic package shows the highest thermal resistance (Rthjc = 3.33 K/W) and temperature rise (172.8°C), limiting its suitability for high-power applications. These results emphasize the significant impact of packaging materials on thermal management, identifying AlN as the most efficient solution for high-power Dr.MOS applications.

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Publication Details

Journal
Journal of Microelectronics and Electronic Packaging
Published
2025-03-15
DOI
https://doi.org/10.4071/001c.133282
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
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article

Thermal Performance Differences Between Ceramic Packages and Lead Frame Packages for Dr.MOS

Journal of Microelectronics and Electronic Packaging
Silicon Carbide Semiconductor Technologies
article

Thermal Performance Differences Between Ceramic Packages and Lead Frame Packages for Dr.MOS

article en

Abstract

This study evaluates the thermal performance of Lead Frame, Al₂O₃ Direct-Plated Copper (DPC) Ceramic, and AlN DPC Ceramic packages in Driver-MOSFET(Dr.MOS) devices. Experimental measurements at 12V and 19V under current loads of 0A–40A, along with ICEPAK simulations, confirm that the AlN DPC Ceramic package achieves the lowest thermal resistance (Rthjc = 1.48 K/W) and temperature rise (120.7°C at 19V, 40A). The Lead Frame package exhibits moderate thermal performance (Rthjc = 2.61 K/W, 144.6°C), while the Al₂O₃ DPC Ceramic package shows the highest thermal resistance (Rthjc = 3.33 K/W) and temperature rise (172.8°C), limiting its suitability for high-power applications. These results emphasize the significant impact of packaging materials on thermal management, identifying AlN as the most efficient solution for high-power Dr.MOS applications.

Journal of Microelectronics and Electronic PackagingVol. 22(1)
Yuan Ze University (TW)
Openalex Percentile: Top 54%
Silicon Carbide Semiconductor Technologies
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