Ultraelastic Lead\nHalide Perovskite Films via Direct\nLaser Patterning

The precise patterning of elastic\nsemiconductors holds\nencouraging\nprospects for unlocking functionalities and broadening the scope of\noptoelectronic applications. Here, perovskite films with notable elasticity\ncapable of stretching over 250% are successfully fabricated by using\na continuous-wave (CW) laser-patterning technique. Under CW laser\nirradiation, perovskite nanoparticles (NPs) undergo meticulous crystallization\nwithin the thermoplastic polyurethane (TPU) matrix, which yields the\ncapability of an unparalleled stretch behavior. Furthermore, the strategic\nintegration of β-phase poly(vinylidene fluoride) (β-PVDF)\nintroduces a highly ordered dipolar framework, augmenting the crystallization\ndynamics of perovskite NPs during the laser-patterning process, thereby\nelevating the patterning efficiency and film quality. Furthermore,\nfull-spectrum visible perovskite films that possess high transparency,\nhigh resolution, and adequate stability are achieved through the precise\ntuning of halide components, thereby emphasizing the impressive versatility\nof the high-elasticity printing technique. Our findings are meaningful\nfor the direct patterning of high-precision, highly elastic semiconductors,\nfinding a way for advancements in stretchable photonic and optoelectronic\ndevices.